Semiconductor Etch Endpoint Detector (EPD)
Global TechSolutions provides endpoint detector (EPD) sensors for semiconductor etch process monitoring.
Endpoint detection is used during plasma etching to monitor process signals and identify when the target etch step has reached its endpoint, helping the equipment determine when to stop or transition the process.
Endpoint Detection in Semiconductor Etch
01
Process Signal Monitoring
The endpoint detector monitors optical or process-related signals generated during the plasma etch process.
02
Etch Endpoint Recognition
Changes in the monitored signal can be used by the process system to identify when the required etch layer has reached its endpoint.
03
Process Control Integration
The endpoint signal can support automated process control by indicating when an etch step should stop or transition to the next stage of the recipe.
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